Inside the lab

Physical
infrastructure.

Thin-film growth and characterization for 2D materials, chalcogenides, nitrides, oxides, and III–V semiconductors.

Explore the instruments, their capabilities, and their records in DMR-FIRST.

MOCVD apparatus at Penn State

The equipment

Find your next instrument.

Chemical vapor deposition

Multimodule MOCVD (2″)

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Characterization

Confocal Raman / PL

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Chemical vapor deposition

Multi-wafer MOCVD (4″)

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Physical vapor deposition

Multimodule MBE

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Physical vapor deposition

In-vacuo Cryogenic ARPES

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Physical vapor deposition

In-vacuo STM

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Physical vapor deposition

Hybrid MBE

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Physical vapor deposition

GenXplor III-V MBE

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Physical vapor deposition

Magnetron Sputtering

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Characterization

FEI Talos F200X TEM

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Characterization

Jupiter XR AFM

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Characterization

Bruker Icon II AFM

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Characterization

Panalytical Empyrean XRD

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Characterization

Panalytical X’Pert XRD

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Research with LATTICE

What will you
discover next?

Connect with the LATTICE team to discuss your research and learn about the developing user program.

Contact user engagement